Hi everyone, I’m having problems during the data treatment. The two samples (please find the project attached with the as-obtained data only, not with the following treatment) are of CuO (copper (II) oxide) were measured in a row and both were measured together with a reference (Cu foil). I have some doubts: 1) The first thing that I did was to calibrate the Reference of the first measurement (peak at maximum of first derivative). Next, I aligned the second Reference keeping the first reference as standard. Did I do correctly until now? 2) I removed the glitches that appeared in the pre-edge (1 glitch) and the EXAFS region (3 glitches) in both measurements. 3) Next, I set the E0 for both samples in the background removal session to set the 0 (zero) point in chi(k). However, when I plot chi(k) the samples profile in high k values differ. I think that they should be at least very close considering that both are the same copper oxide standard and measured in sequence. Am I correct? 4) I've also noticed that the first measurement (Cu_o_2), when plot in chi(R) has a small (but significant) peak positioned at R = 1, which seems not be right, as bond distances are bigger (> 1.5, for example). Is there anything wrong or missing at background removal treatment? I know that it seems novice doubts but as I’m new to XAFS, it really intrigues me. Best regards, Pedro Martins